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The horizontal vacuum diffusion furnace equipment can be applied in various fields such as integrated circuits, discrete devices, power semiconductor wafers, power electronics, POWER, MEMS, etc. It is suitable for the diffusion, GPP, annealing, and alloying processes of 4-8 inch silicon wafers.

The diffusion process involves inserting impurity elements into the silicon substrate at high temperatures using thermal diffusion principles to achieve a specific concentration distribution, thereby altering the electrical properties of the material and forming semiconductor device structures. It can be used to create PN junctions or components such as resistors, capacitors, diodes, power semiconductor wafers, and crystal tubes in integrated circuits.

II. Equipment Parameters and Types:

III. Main Features and Advantages of the Equipment

1★ Powerful operational functionality with a Windows interface and display screen, allowing users to conveniently modify process control parameters and monitor various process statuses in real time; equipped with fault self-diagnosis software, significantly reducing maintenance time;

2★ Reliable industrial computer + PLC mode for fully automated control of furnace temperature, boat movement, gas flow, and valves, achieving complete automation of all process steps;

3★ The program supports manual/automatic operation. After power failure or mid-process interruption, restarting allows manual temperature ramping based on the process, saving process time;

4★ Multiple process pipelines available for user convenience;

5★ The cold end uses PT100 to detect ambient temperature for temperature compensation, avoiding the impact of ambient temperature changes on furnace temperature and preventing interlayer interference;

6★ The boat movement control employs high-speed pulse closed-loop control to prevent motor step loss and operational vibration. After completing a cycle, the boat automatically calibrates its position, effectively preventing positioning deviations;

7★ Precise gas flow control using analog signal closed-loop control, with strong and weak electrical separation. Data exchange utilizes standard buses to enhance anti-interference capability and ensure data security; gas valves feature soft-start functionality;

8★ Multiple alarm functions and safety protection features;
9★ Automatic adjustment of the constant temperature zone, cascade control, and accurate control of the actual process temperature in the reaction tube;