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The horizontal oxidation furnace equipment can be applied in integrated circuits, discrete devices, POWER, MEMS, and other fields, suitable for oxidation, diffusion, GPP, annealing, alloying, and other processes for 4-8 inch wafer chips.

The oxidation process involves placing the wafer in an oxygen or water vapor environment for high-temperature heat treatment, forming an oxide film on the wafer surface. This film can serve as a barrier layer for ion implantation, an injection penetration layer, surface passivation, or a dielectric layer for device structures.

2. Equipment Parameters and Types:

3. Main Features and Advantages of the Equipment

1★ Powerful operational functionality with a Windows interface and display screen operation, allowing users to conveniently modify process control parameters and monitor various process statuses in real time; equipped with fault self-diagnosis software, significantly reducing maintenance time;

2★ Adopts a reliable industrial computer + PLC mode for fully automated control of furnace temperature, boat movement, gas flow, and valves, achieving complete automation of all process steps;

3★ The program supports manual/automatic operation. After power failure or mid-process shutdown, restarting allows for manual temperature ramping based on the process, saving process time;

4★ Features multiple process pipelines for user convenience;

5★ The cold end uses PT100 to detect ambient temperature for temperature compensation, avoiding the impact of ambient temperature changes on furnace temperature and preventing interlayer interference;

6★ The boat movement control employs high-speed pulse closed-loop control to avoid motor step loss and operational vibration. After completing a cycle, the boat automatically calibrates its position, effectively preventing positioning deviation;

7★ Precise gas flow control with analog signal closed-loop control, strong and weak electrical separation, and standard bus communication for data exchange, enhancing anti-interference capability and ensuring data security; gas valves feature a soft-start function;

8★ Includes multiple alarm functions and safety protection features;
9★ Automatic adjustment of the constant temperature zone, cascade control, and accurate control of the actual process temperature in the reaction tube;